August 20, 2016
Bayer Landscape Architecture is seeking Entry & Mid Level Landscape Architects to fill openings at our studio / office located in the historic Village of Honeoye Falls, New York.
Bayer Landscape Architecture, PLLC is an award-winning, professional design firm based near Rochester, New york that has focused on the creation of unique and sustainable outdoor environments for over 25 years. The firm maintains a diverse and thriving practice with a wide range of project types including urban parks and plazas, campus planning and design, high-end residential, and historic preservation.
We are seeking talented, vibrant designers that will thrive in a creative studio environment. The successful candidates will collaborate with other members of the team on an impressive array of projects and will be involved with all phases of the design process. Both positions offer a competitive salary and benefits package that will be tailored to the successful candidate's qualifications. Bayer Landscape Architecture, PLLC is an equal opportunity employer.
Entry Level Candidates must demonstrate exceptional design, communication, and interpersonal skills, and should have advanced knowledge of AutoCAD, the Adobe Creative Suite, and SketchUp. Candidates must have a Bachelors or Masters Degree in Landscape Architecture. Experience for entry level candidates can range from recent graduates to designers that have completed up to 3 years of professional practice.
Mid-Level Candidates should possess all of the skills outllined in the entry-level position above, plus 4 or more years of solid experience in a professional design office. Preference will be given to mid-level candidates with dual or addtional degrees in the related disciplines of Urban Design, Horticulture, Architecture, or Planning. Mid-level candidates are also expected to have excellent technical skills and project management experience.
Interested candidates should forward a cover letter, resume, portfolio, and other pertinent information to Mark Bayer, Principal.